Coaxial plasma arc vapor deposition apparatus and method

Details Coaxial plasma arc vapor deposition apparatus and method Coaxial plasma arc vapor deposition apparatus and method

2011-01-11

2011-01-11

Neckel, Alexa D (Department: 1795)

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

C204S298410

Reexamination Certificate

active

07867366

ABSTRACT:
An apparatus for the deposition of a variable thickness coating onto the inside of a cylindrical tube comprises a variable pressure gas, an cathode coaxially positioned within the cylinder, and a voltage source applied between the cathode and cylindrical tube, which functions as an anode. A radial plasma arc is generated between the anode and cathode at a starting point on the cylinder, and the plasma arc travels down the central axis of the cylinder, providing a helical deposition region on the inside of the cylinder. Selection of the combination of cathode material and gas enable the plasma to generate ionic material which is deposited on the anodic cylinder in the region of the plasma. By varying the pressure of variable pressure gas for each helical path, it is possible to vary the composition of this deposition film.

REFERENCES:
patent: 2972695 (1961-02-01), Wroe
patent: 3625848 (1971-12-01), Snaper
patent: 3627590 (1971-12-01), Mammel
patent: 3783231 (1974-01-01), Sablev et al.
patent: 4407712 (1983-10-01), Henshaw et al.
patent: 4407713 (1983-10-01), Zega
patent: 4492845 (1985-01-01), Kljuchko
patent: 4609564 (1986-09-01), Pinkhasov
patent: 4724058 (1988-02-01), Morrison, Jr.
patent: 4849088 (1989-07-01), Veltrop et al.
patent: 4859489 (1989-08-01), Pinkasov
patent: 5026466 (1991-06-01), Wesemeyer et al.
patent: 5037522 (1991-08-01), Vergason
patent: 5269898 (1993-12-01), Welty
patent: 5277714 (1994-01-01), Tamagaki
patent: 5306408 (1994-04-01), Treglio
patent: 5354963 (1994-10-01), Muller et al.
patent: 5744017 (1998-04-01), Tamagaki et al.
patent: 5908602 (1999-06-01), Bardos et al.
patent: 5976636 (1999-11-01), Leu et al.
patent: 6103074 (2000-08-01), Khominich
patent: 6193853 (2001-02-01), Yumshtyk et al.
patent: 6346301 (2002-02-01), Beele et al.
patent: 6811660 (2004-11-01), Maekawa
patent: 6866752 (2005-03-01), Schramm
patent: 2004/0134770 (2004-07-01), Petersen
patent: 58207680 (1983-12-01), None
http://www.tokenonline.net/pdf/hv-resistor.pdf [Accessed on Aug. 24, 2007].
Cathode definition (http://www.merriam-webster.com/dictionary/cathode) [Accessed on Nov. 17, 2008].
Anode Definition (http://www.merriam-webster.com/dictionary/anode) [Accessed on Nov. 17, 2008].
Titanium Nitride properties (http://www.memsnet.org/material/titaniumnitridetinbulk/) [Accessed on Nov. 18, 2008].

Affiliated with

Also associated with

Rating

Coaxial plasma arc vapor deposition apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Coaxial plasma arc vapor deposition apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Coaxial plasma arc vapor deposition apparatus and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2649458