Method of evaluating a photo mask and method of...

Details Method of evaluating a photo mask and method of... Method of evaluating a photo mask and method of...

2011-03-22

2011-03-22

Rosasco, Stephen (Department: 1721)

Image analysis

Applications

Manufacturing or product inspection

C430S005000

Reexamination Certificate

active

07912275

ABSTRACT:
A method of evaluating a photo mask, includes measuring each dimension of a plurality of pattern portions of a mask pattern formed on a photo mask, obtaining an inter-pattern distance between the pattern portion and a pattern different from the pattern portion with respect to each of the pattern portions, obtaining a dimensional difference between the measured dimension of the pattern portion and a target dimension of the pattern portion with respect to each of the pattern portions, grouping the dimensional difference obtained for each pattern portion into a plurality of groups in accordance with the inter-pattern distance obtained for each pattern portion, obtaining an evaluation value based on the dimensional difference in each group with respect to each of the groups, and evaluating the photo mask based on the evaluation value.

REFERENCES:
patent: 2006/0190875 (2006-08-01), Arisawa et al.
patent: 2003-241364 (2003-08-01), None

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