Method for fabricating a photonic crystal or photonic...

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Compound semiconductor

Reexamination Certificate

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C257S081000, C257S102000, C372S007000, C372S096000

Reexamination Certificate

active

07883914

ABSTRACT:
The invention relates to fabrication of VCSELs. It provides a method for fabricating a VCSEL that contains a micro
ano-structured mode selective lateral layer, where the micro
ano-structured layer is obtained by well controlled local etching. The invention enables control of the micro
ano-structured layer thickness with very high precision. In particular, the invention relates to a method for fabricating a VCSEL with a micro
ano-structured mode selective layer for controlling the VCSELs transverse electromagnetic modes.

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patent: 2007/0091965 (2007-04-01), Tanabe et al.
patent: WO 02/073753 (2002-09-01), None
patent: WO 2006/056208 (2006-06-01), None
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W.D. Zhou et al., “Electrically injected single-defect photonic bandgap surface-emitting laser at room temperature”, Electronics Letters, vol. 36, No. 18, Aug. 31, 2000, 2 pgs.
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