Method for patterning a radiation beam, patterning device...

Details Method for patterning a radiation beam, patterning device... Method for patterning a radiation beam, patterning device...

2011-02-15

2011-02-15

Glick, Edward J (Department: 2882)

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C355S055000

Reexamination Certificate

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07889316

ABSTRACT:
A multiple-die mask pattern is arranged with dies having the same pattern in mutually opposite orientations. The method for arranging the dies includes analyzing the pattern of a single die to identify a pattern characteristic property which is non uniformly distributed over the area of the die. If the distribution is found to be asymmetric, a line separating the die area into two half-die areas is defined with respect to which the asymmetry is apparent. Half-die areas of different dies with the same pattern characteristic property are grouped together in the mask pattern. The resulting enhanced symmetry of the distribution of the pattern characteristic property over the mask area increases lithographic processability and thereby improves die yield.

REFERENCES:
patent: 6180289 (2001-01-01), Hirayanagi
patent: 2005/0208427 (2005-09-01), Hayano et al.
patent: 11-038638 (1999-02-01), None
Office Action in related Japanese application No. 2007-120465 mailed Jun. 11, 2010.

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