Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

2011-03-15

2011-03-15

Kim, Peter B (Department: 2882)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000

Reexamination Certificate

active

07907251

ABSTRACT:
An exposure apparatus (1) has a projection optical system (30) for projecting a pattern of a reticle onto a substrate, and exposes the substrate (40) via a liquid supplied in a space between the projection optical system (30) and the substrate (40). The exposure apparatus includes a gas curtain producer having two gas supply ports (103a, 103b) for supplying a gas to a circumference of the liquid and for limiting the liquid, the two gas supply ports (103a, 103b) supplying different types of gases (PG1, PG2).

REFERENCES:
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patent: 2007/0070316 (2007-03-01), Ehrmann et al.
patent: 2004-289126 (2004-10-01), None
patent: 2005-136413 (2005-05-01), None
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patent: WO 99/49504 (1999-09-01), None
patent: WO 2004/055803 (2004-07-01), None
patent: WO 2004/086470 (2004-10-01), None
patent: WO 2004/093159 (2004-10-01), None
patent: WO 2006/101120 (2006-09-01), None
International Search Report issued on Dec. 12, 2006 for International Application No. PCT/JP2006/321001.

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