Method for producing group-III-element nitride single...

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Havin growth from molten state

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C117S068000, C117S074000, C117S075000, C117S078000, C117S223000, C117S224000, C117S952000

Reexamination Certificate

active

07959729

ABSTRACT:
A production method is provided in which Group-III-element nitride single crystals that have a lower dislocation density and a uniform thickness and are transparent, high quality, large, and bulk crystals can be produced with a high yield. The method for producing Group-III-element nitride single crystals includes: heating a reaction vessel containing at least one metal element selected from the group consisting of an alkali metal and an alkaline-earth metal and at least one Group III element selected from the group consisting of gallium (Ga), aluminum (Al), and indium (In) to prepare a flux of the metal element; and feeding nitrogen-containing gas into the reaction vessel and thereby allowing the Group III element and nitrogen to react with each other in the flux to grow Group-III-element nitride single crystals, wherein the single crystals are grown, with the flux being stirred by rocking the reaction vessel, for instance.

REFERENCES:
patent: 3811963 (1974-05-01), Howrylo et al.
patent: 3858553 (1975-01-01), Scheel
patent: 5366552 (1994-11-01), Yamada et al.
patent: 5868837 (1999-02-01), DiSalvo et al.
patent: 6270569 (2001-08-01), Shibata et al.
patent: 6398867 (2002-06-01), D'Evelyn et al.
patent: 6531072 (2003-03-01), Suda et al.
patent: 2002/0046695 (2002-04-01), Sarayama et al.
patent: 2002/0175338 (2002-11-01), Sarayama et al.
patent: 1 201 793 (2002-05-01), None
patent: 75011870 (1975-05-01), None
patent: 60-122797 (1985-07-01), None
patent: 01242483 (1989-09-01), None
patent: 2000-327495 (2000-11-01), None
patent: 2001-53013 (2001-02-01), None
patent: 2002-68896 (2002-03-01), None
patent: 2002068896 (2002-03-01), None
patent: 2002-293696 (2002-10-01), None
patent: 2003-527296 (2003-09-01), None
patent: 01/68955 (2001-09-01), None
Patent Abstracts of Japan. English Abstract of JP 2002-68896A (2002).
Kawamura et al., “Growth of large GaN single crystal using the liquid phase epitaxy (LPE) technique.”, Jpn. J. Appl. Phys. vol. 42 (2003). pp. L4-L6.
Kawamura et al., “Synthesis of Bulk GaN single crystals using Na-Ca flux”, Jpn. J. Appl. Phys. vol. 41 (2002). pp. L1440-L1442.
Derwent Abstract of JP 75011870 B (1975).
Patent Abstracts of Japan. English Abstract of JP 01-242483 (1989).
Kawamura, et al.. “Novel Liquid Phase Epitaxy (LPE) Growth Method for Growing Large GaN Single Crystals: Introduction of the Flux Film Coated-Liquid Phase Epitaxy (FFC-LPE) Method”, Jpn. J. Appl. Phys. vol. 42 (2003), pp. L-829-L-881, Part 2, No. 8A Aug. 1, 2003.
Grzegory, et al., “III-V Nitrides—Thermodynamics and Crystal Growth at High N2Pressure”, J. Phys. Chem. Solids, vol. 56. No. ¾. pp. 639-647, 1995.
Song, et al., “Buld GaN single crystals: growth conditions by flux method”, Journal of Crystal Growth 247 (2003). pp. 275-278.
Kawamura, et al.. “Synthesis of Bulk GaN Single Crystals Using Na-Ca Flux”. Jpn. J. Appl. Phys. vol. 41, (2002), pp. L1440-L1442.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for producing group-III-element nitride single... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for producing group-III-element nitride single..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing group-III-element nitride single... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2643100

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.