Method for producing color filter, color filter, liquid...

Liquid crystal cells – elements and systems – Nominal manufacturing methods or post manufacturing...

Reexamination Certificate

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C349S106000

Reexamination Certificate

active

07999907

ABSTRACT:
Exfoliation of an etching stopper is prevented. A color filter of the present invention includes an inorganic protection film (etching stopper) composed mainly of SnO2. Since the inorganic protection film as such not only has a high specific resistance but also has a linear expansion coefficient close to the linear expansion coefficient of a transparent electrode, the inorganic protection film is not exfoliated from the transparent electrode or the resin layer even if an object to be processed is heated. Since the inorganic protection film and the transparent electrode can be formed in the same film forming chamber, the time required to produce the color filter can be shortened as compared to in the conventional technique.

REFERENCES:
patent: 5441615 (1995-08-01), Mukai et al.
patent: 6259505 (2001-07-01), Makino
patent: 2007/0002252 (2007-01-01), Kaneko et al.
patent: 60-112001 (1985-06-01), None
patent: 64-26821 (1989-01-01), None
patent: 2-284118 (1990-11-01), None
patent: 4-303824 (1992-10-01), None
patent: 7-318713 (1995-12-01), None
patent: 2001-174838 (2001-06-01), None
patent: 2003-66217 (2003-03-01), None
patent: 2003-287618 (2003-10-01), None
International Search Report for International Application No. PCT/JP2008/064802 dated Sep. 4, 2008.

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