Method to recover the exposure sensitivity of chemically...

Details Method to recover the exposure sensitivity of chemically... Method to recover the exposure sensitivity of chemically...

2011-07-12

2011-07-12

Young, Christopher G (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000, C430S330000

Reexamination Certificate

active

07977017

ABSTRACT:
Methods of fabricating a photomask, methods of treating a chemically amplified resist-coated photomask blank, a photomask blank resulting from the methods, and systems for fabricating a photomask are provided. The method is useful for recovering the exposure sensitivity of a chemically amplified resist disposed on a photomask blank from a post-coat delay effect.

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