Method and apparatus for curing coated film

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate

Reexamination Certificate

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C427S600000

Reexamination Certificate

active

08007874

ABSTRACT:
According to the method and the apparatus for curing a coated film of the present invention, since an ionization radiation is applied after the O2concentration in the near-surface layer within 1 mm above the surface of the coated film is adjusted to 1000 ppm or lower, the coated film can be sufficiently cured by irradiation of the ionization radiation. In other words, according to the method and the apparatus for curing a coated film of the present invention, since the O2concentration in a thin near-surface layer on the surface of a coated film is decreased, the coated film can be sufficiently cured by irradiation of an ionization radiation. As a result, the amount of inert gas supplied upon irradiation of an ionization radiation can be reduced, and downsizing and cost reduction of equipment can be achieved.

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CN First Office Action, dated Jul. 31, 2009, issued in corresponding CN Application No. 200680008809.2, 9 pages in English and Chinese.

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