Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate
2011-01-11
2011-01-11
Lee, Hwa S. A (Department: 2886)
Optics: measuring and testing
By light interference
For dimensional measurement
Reexamination Certificate
active
07869055
ABSTRACT:
Process control monitors are disclosed that are produced using at least some of the same process steps used to manufacture a MEMS device. Analysis of the process control monitors can provide information regarding properties of the MEMS device and components or sub-components in the device. This information can be used to identify errors in processing or to optimize the MEMS device. In some embodiments, analysis of the process control monitors may utilize optical measurements.
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Cummings William
Gally Brian
A Lee Hwa S.
Knobbe Martens Olson & Bear LLP
QUALCOMM MEMS Technologies Inc.
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