Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate
2011-07-12
2011-07-12
Lee, Hwa S. A (Department: 2886)
Optics: measuring and testing
By light interference
For dimensional measurement
Reexamination Certificate
active
07978339
ABSTRACT:
A lithographic apparatus includes a position measurement system to determine along a measurement path a position of a first part of the lithographic apparatus with respect to a position of a second part of the lithographic apparatus. The position determination system comprises a plurality of temperature sensors to measure a temperature of a medium along the measurement path. The position measurement system corrects the determined position making use of the temperature as measured by the temperature sensors.
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Beems Marcel Hendrikus Maria
Eussen Emiel Jozef Melanie
Van Empel Tjarko Adriaan Rudolf
A Lee Hwa S.
ASML Netherlands B.V.
Sterne Kessler Goldstein & Fox P.L.L.C.
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