Production method of film, and film

Details Production method of film, and film Production method of film, and film

2011-05-24

2011-05-24

Nakarani, D. S (Department: 1787)

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

C427S489000, C427S576000, C427S578000, C428S451000

Reexamination Certificate

active

07947330

ABSTRACT:
A production method of a film of the present invention is a production method of a film, in which after a polymer base is wound off, metal is evaporated, and an oxygen gas is introduced and the inorganic compound layer is formed in an excitation atmosphere of an organic silicon compound containing gas when an inorganic compound layer is formed on the surface of a polymer base. The production method of a film of the present invention can produce a film having a high gas barrier property against an oxygen gas, a water vapor and the like.

REFERENCES:
patent: 5434008 (1995-07-01), Felts
patent: 2005/0287378 (2005-12-01), Klein et al.
patent: 0 470 777 (1992-02-01), None
patent: 4-251736 (1992-09-01), None
patent: 8-72193 (1996-03-01), None
patent: 10095067 (1998-04-01), None

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