Ruled line development system in a word processing apparatus

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340747, G06F 3153

Patent

active

047605529

ABSTRACT:
A ruled line pattern is divided into four line elements, two of them being assigned to represent the vertical rule line and the remaining two elements being assigned to represent the horizontal rule line. Selection keys are provided on a keyboard panel for selecting a desired line element. The ruled line data is of four (4) bit construction and is developed in response to the input operation conducted through the selection keys. The first and the third bits of the ruled line data represent the horizontal rule line, and the second and fourth bits of the ruled line data represent the vertical rule line in each address.

REFERENCES:
patent: 3501746 (1970-03-01), Vosbury
patent: 3579193 (1971-05-01), Bernier
patent: 3579195 (1971-05-01), Hallmark et al.
patent: 3665450 (1972-05-01), Leban
patent: 3675208 (1972-04-01), Bard
patent: 3810166 (1974-05-01), Atkin
patent: 3818482 (1974-06-01), Yoshida et al.
patent: 3895374 (1975-07-01), Williams
patent: 3906480 (1975-09-01), Schwartz et al.
patent: 3974493 (1976-08-01), de Cavaignac et al.
patent: 3974494 (1976-08-01), Yamazaki et al.
patent: 3976982 (1976-08-01), Eiselen
patent: 4041482 (1977-08-01), Freudeberg et al.
patent: 4190835 (1980-02-01), Buynak
patent: 4392130 (1983-07-01), Lundstrom et al.
patent: 4416558 (1983-11-01), McInroy et al.
patent: 4417239 (1983-11-01), Demka et al.

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