1990-01-18
1991-10-08
Jackson, Jr., Jerome
357 2312, H01L 2712, H01L 4500, H01L 2978
Patent
active
050558870
ABSTRACT:
An improved FET is disclosed. The transistor is characterized in that its channel is in the form of a superlattice. The superlattice structure provides a number of square well potential areas through which carriers can pass with little interaction with the gate insulating film. The advantages of the superlattice structure are further enhanced by modifying the energy band structure to reduce carrier concentration near a gate insulating film.
REFERENCES:
patent: 4620206 (1986-10-01), Ohta et al.
patent: 4794611 (1988-12-01), Hara et al.
patent: 4908678 (1990-03-01), Yamazaki
Jackson, Jr. Jerome
Meier Stephen D.
Semiconductor Energy Laboratory Co,. Ltd.
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