Process for preparing photosensitive heat-resistant polymer

Details Process for preparing photosensitive heat-resistant polymer Process for preparing photosensitive heat-resistant polymer

1990-01-08

1991-10-08

Kight, III, John

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From carboxylic acid or derivative thereof

528305, 528125, 528126, 528172, 528176, 528179, 528182, 528188, 528192, 528220, 528222, 528224, 528226, 528229, 528312, 528313, 528322, 525422, 525426, C08G 6908

Patent

active

050555499

ABSTRACT:
The present invention is connected with a process for preparing a novel photosensitive polyimide precursor having excellent shelf stability and high sensitivity and containing less impurities.
The process for preparing a photosensitive heat-resistant polymer containing a repeating unit represented by the formula (III) comprises the step of reacting a photosensitive group-containing isoimide represented by the formula (I) with a diamine represented by the formula (II) at a temperature of 0.degree. to 100.degree. C. in the presence of a solvent: ##STR1## wherein R.sup.1 is independently a tetravalent carbon cyclic aromatic group or heterocyclic group; R.sup.2 is independently an aliphatic group having at least 2 carbon atoms, an alicyclic group, an aromatic aliphatic group, a carbon cyclic aromatic group, a heterocyclic group or a polysiloxane group; R.sup.3 is a monovalent organic group having a photosensitive unsaturated group; and D is an oxygen atom or .dbd.N--R.sup.3.

REFERENCES:
patent: 4551522 (1985-11-01), Inyd et al.
patent: 4645823 (1987-02-01), Ai et al.

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