Method for forming deposition film using Si compound and active

Details Method for forming deposition film using Si compound and active Method for forming deposition film using Si compound and active

1985-10-07

1988-07-26

Childs, Sadie L.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 39, 427 531, 4272551, 4272552, 4272557, B05D 306

Patent

active

047599472

ABSTRACT:
A method for forming a deposition film comprises introducing, into a film forming chamber for forming a deposition film on a substrate, a silicon compound as a material for film formation and an active species generated from a compound containing carbon and halogen and capable of chemical interaction with said silicon compound, and applying thereto at least an energy selected from optical, thermal and discharge energies to excite said silicon compound and to cause a reaction thereof, thus forming a deposition film on said substrate.

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