Electroplating apparatus particularly for electro-deposition of

Details Electroplating apparatus particularly for electro-deposition of Electroplating apparatus particularly for electro-deposition of

1987-04-02

1988-07-26

Tufariello, T. M.

Chemistry: electrical and wave energy

Processes and products

204225, C25D 500

Patent

active

047598310

ABSTRACT:
An electroplating apparatus having electroplating tank which is closable air-tight and charged with an inert gas above the electrolyte and also includes one vacuum lock for charging and discharging goods to be electroplated. The lock chamber of the vacuum lock is equipped with an inner lock door and an outer lock door and is preferably evacuated with the assistance of a vacuum pump so that solvent vapors can be condensed during evacuation in a condenser. The apparatus increases the useful life of the electrolyte, particularly an aprotic, aluminum-organic electrolyte which is used in aluminum plating in comparison to previously known locks which use gas and liquid locks.

REFERENCES:
patent: 2897129 (1959-07-01), Dilling
patent: 3489537 (1970-01-01), Cook
patent: 4053383 (1977-10-01), Dotzer
patent: 4265726 (1981-05-01), Herrnring et al.
patent: 4363712 (1982-12-01), Birkle et al.
patent: 4415422 (1983-11-01), Birkle et al.
patent: 4417722 (1983-11-01), Ishii et al.
patent: 4425211 (1984-01-01), Birkle et al.

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