Monitoring method and apparatus of surface area of semiconductor

Details Monitoring method and apparatus of surface area of semiconductor Monitoring method and apparatus of surface area of semiconductor

1997-01-30

1998-10-20

Trammell, James P.

Boots, shoes, and leggings

204228, 204231, 204407, 324444, 324439, G01B 1322, C25D 1132

Patent

active

058256687

ABSTRACT:
A surface-roughened polysilicon wafer is submerged in an electrolytic solution, and a voltage is applied between the measured wafer and a reference wafer submerged in the same electrolytic solution. The surface area of the surface-roughened polysilicon wafer is determined from the current with excellent accuracy.

REFERENCES:
patent: 3617101 (1971-11-01), Anderson
patent: 4065374 (1977-12-01), Asami et al.
patent: 4120759 (1978-10-01), Asami et al.
patent: 4798655 (1989-01-01), Diamond
patent: 4995939 (1991-02-01), Ferenczi et al.
patent: 5139624 (1992-08-01), Searson et al.
patent: 5175124 (1992-12-01), Winebarger
patent: 5223081 (1993-06-01), Doan
patent: 5289132 (1994-02-01), Oksman et al.
patent: 5439569 (1995-08-01), Carpio

Affiliated with

Also associated with

Rating

Monitoring method and apparatus of surface area of semiconductor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Monitoring method and apparatus of surface area of semiconductor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Monitoring method and apparatus of surface area of semiconductor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-252317