Multi-beam pitch adjustment system and method

Details Multi-beam pitch adjustment system and method Multi-beam pitch adjustment system and method

Filed on

1997-01-21

Date issued

1998-07-28

Examiner

Allen, Stephone B.

Patent Class

Radiant energy

SubClass

Photocells; circuits and apparatus

SubSubClass

Optical or pre-photocell system

Other Related Categories

358474, H04N 136

Type

Patent

Status

active

Patent number

057865949

Description

ABSTRACT:
The current disclosure discloses methods of and systems for automatically adjusting or selecting a pitch between beams in a multi-beam scanning system. An array of light sources is mounted on a rotatable housing and emits light in a direction perpendicular to the rotational plane. The system or method measures a pitch on or near an intermediate image-forming surface. In response to the measured pitch, the scanning as well as sub-scanning pitch is automatically adjusted or selected by rotating a housing unit to maintain a desired pitch.

REFERENCES:
patent: 5371608 (1994-12-01), Muto et al.
patent: 5615038 (1997-03-01), Suzuki et al.
Article (in Japanese) by Nakamori entitled "Fuji-Xerox Development of 2-Beam Writing Unit In Laser Printer," Nikkei Electronics, Jun. 19, 1995 (No. 638), p. 18.
Article (in Japanese) by Fukui, et al. entitled "DualSpot Scanning System Technology Utilized in DocuStation DP300," Fuji Xerox Technical Report, No. 10, 1995, pp. 132-137.
Article by Mochizuki, et al. entitled "Dual Beam Diode Laser Scanning System for High Speed Laser Beam Printers," The 9th International Congress on Advances in Non-Impact Printing Technologies/Japan Hardcopy '93, Oct. 4-8, 1993, pp. 222-225.

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