Controlled hot-electron writing method for non-volatile...

Static information storage and retrieval – Floating gate – Particular biasing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C365S185180

Reexamination Certificate

active

06172908

ABSTRACT:

TECHNICAL FIELD
The present invention relates to a controlled hot-electron writing method for non-volatile memory cells. In particular, for the purposes of the present patent, the term “writing” indicates programming of the cell from an erased condition to a condition for storing a desired threshold value, and the operation of “soft-writing” means correcting the threshold voltage of overwritten cells (which involves the partial re-writing of the cells so as to set them all to the same erase threshold voltage).
BACKGROUND OF THE INVENTION
As is known, non-volatile memories are becoming increasingly important in modern-day microelectronics, both as separate components and as components forming part of more complex devices; in this context, flash memories play a leading role, which is expected to increase significantly in the future.
Flash memories (as well as EPROMs) use the technique of hot electron injection for programming of the cells. As is known, programming presents two problems which are particularly critical in the case of multilevel programming used to store more than one bit for each cell: a) accurate control of the programmed threshold voltages; and b) control and limitation of the drain current flowing in the cell during programming.
The second problem, in particular, directly affects the possibility of operating in parallel on a large number of cells, which is of crucial importance for the operation of “soft-writing” erased flash cells. In general, however, this control function is important for achieving an increase in the performance during the storage of information.
In general, limitation of the cell current represents only one aspect of the more complex problem of controlling the current since, in order to optimize writing, the drain current should theoretically remain constant during the entire operation, so as to avoid high initial current peaks, followed by lower currents, which result in inefficient programming.
On the other hand, the problem of accurately controlling the programmed threshold voltage is important for digital memories and is absolutely crucial for multilevel storage, in view of the limited margins which separate the various levels within the available threshold window.
At present, in order to control the threshold after a programming stage, a verify operation consisting of reading the programmed cell is carried out. This method, however, involves a long and complicated procedure as well as a considerable use of space; consequently, the possibility of controlling in an accurate and reliable manner the threshold voltage of the cell during programming would be highly desirable.
The conventional writing procedure used for the present generation of flash memories (and EPROMs) uses rectangular pulses for the control gate and drain voltages (V
cg
and V
d
, respectively); consequently, programming is characterized by high drain currents, in particular at the start of the programming pulse, when the overdrive voltage (i.e., the difference between the control gate voltage and the threshold voltage) is high.
Some solutions have therefore been proposed in order to limit the drain current and/or control the overdrive current, but none of them achieves the ideal result of programming the cell with a constant current.
SUMMARY OF THE INVENTION
An object of the invention is therefore to provide an improved writing method for flash memories able to operate with a constant drain current, at least for a substantial part of the programming time.
According to the present invention, a controlled hot-electron writing method for non-volatile memory cells is provided. The method includes applying appropriate biasing voltages to a drain and control gate of a non-volatile memory cell and, at the same time, holding a floating gate voltage substantially constant during at least part of the time during which the non-volatile cells are being programmed.
According to the detailed description given below, in order to optimize writing of the cell, the latter is written in an equilibrium condition, with a constant floating gate region voltage and currents. In particular, both for programming and soft-writing after erasing, the substrate region of the cell is biased at a negative voltage with respect to the source region, and the control gate region of the cell receives a ramp voltage having a slope selected so that it is possible to achieve the condition of an equilibrium between the injection current flowing towards the floating gate region and the displacement current associated with the equivalent capacitor arranged between the floating gate and control gate regions.


REFERENCES:
patent: 5042009 (1991-08-01), Kazerounian et al.
patent: 5481492 (1996-01-01), Schoemaker
patent: 5487033 (1996-01-01), Keeney et al.
patent: 5521867 (1996-05-01), Chen et al.
patent: 5546340 (1996-08-01), Hu et al.
patent: 5576991 (1996-11-01), Radjy et al.
patent: 5576992 (1996-11-01), Mehrad
patent: 5856946 (1999-01-01), Chan et al.
patent: 5870334 (1999-02-01), Hemink et al.
patent: 0 463 331 A2 (1992-01-01), None
patent: 0 744 754 A2 (1996-11-01), None
Chi, Min-hwa and Albert Bergemont, “Multi-level Flash/EPROM Memories: New Self-convergent Programming Methods for Low-voltage Applications,”IEEE IEDM Technical Digest, pp. 271-274, 1995.
Eitan, Boza et al, “Multilevel Flash cells and their Trade-offs,”IEEE IEDM Technical Digest, pp. 169-172, 1996.
Yamada, Seiji et al., “Self-Convergence Erase for NOR Flash EEPROM Using Avalanche Hot Carrier Injection,”IEEE Transaction on Electron Devices, 43(11):1937-1941, Nov. 1996.
Hu, Ching-Yuan, et al. “A Convergence Scheme for Over-Erased Flash EEPROM's Using Substrate-Bias-Enhanced Hot Electron Injection,”IEEE Electron Device Letters, 16(11):500-502, Nov. 1995.
Takeda, E. et al., “New hot-carrier injection and device degradation in submicron MOSFETs,”IEE Proc., vol. 130, Pt. 1, No. 3, pp. 144-149 Jun. 1983.
Takeda, E., “Hot-carrier effects in submicrometre MOS VLSIs”IEE Proc., vol. 131, Pt. 1, No. 5, pp. 153-161, Oct. 1984.
Wu, Ching-Yuan and Choiu-Feng Chen, “Physical Model For Characterizing And Simulating A FLOTOX EEPROM Device,”Solid-State Electronics,35(5), pp. 705-716, 1992.
Kong, Sik On and Chee Yee Kwok, “A Study Of Trapezoidal Programming Waveform For The FLOTOX EEPROM,”Solid-State Electronics, 36(8), pp. 1093-1100, 1993.
Bez, Roberto et al., “Experimental Transient Analysis of the Tunnel Current in EEPROM Cells,”IEEE Transaction On Electron Devices, 37(4), pp. 1081-1086, Apr. 1990.
Bude, J.D. et al., “EEPROM/Flash Sub 3.0V Drain-Source Bias Hot Carrier Writing,”IEEE IEDM Technical Digest, 989-991, 1995.
Nissan-Cohen, Y., “A Novel Floating-Gate Method for Measurement of Ultra-Low Hole and Electron Gate Currents in MOS Transistors,”IEEE Electron Device Letters, vol. EDL-7, No. 10, pp. 561-563, Oct. 1986.
Esseni, David et al., “Temperature Dependence of Gate and Substrate Currents in the CHE Crossover Regime,”IEEE Electron Device Letters, 16(11), pp. 506-508, Nov. 1995.
Bez, R. et al, “A Novel Method For The Experimental Determination Of The Coupling Rations In Submicron EPROM and Flash EEPROM Cells,”IEEE IEDM Technical Digest,pp. 99-102, 1990.
Montanari, D. et al., “Comparison Of The Suitability Of Various Programming Mechanisms Used For Multilevel Non-Volatile Information Storage,”Proc. ESSDERC Conf., p. 139, 1996.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Controlled hot-electron writing method for non-volatile... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Controlled hot-electron writing method for non-volatile..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Controlled hot-electron writing method for non-volatile... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2506122

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.