Drug – bio-affecting and body treating compositions – Topical sun or radiation screening – or tanning preparations
Reexamination Certificate
2000-02-14
2001-06-19
Dodson, Shelley A. (Department: 1616)
Drug, bio-affecting and body treating compositions
Topical sun or radiation screening, or tanning preparations
C424S060000, C424S400000, C424S401000, C514S241000
Reexamination Certificate
active
06248311
ABSTRACT:
BACKGROUND OF THE INVENTION
1. Technical Field of Invention
The present invention relates to novel cosmetic compositions for topical application, for the photoprotection of the skin and/or hair against ultraviolet radiation (such compositions hereinafter simply designated “antisun,” “sunscreen” or “photoprotective” compositions) and to the use of the same for the cosmetic applications indicated above.
This invention more especially relates to the aforesaid sunscreen/cosmetic compositions comprising, formulated into a cosmetically acceptable vehicle, diluent or carrier therefor, binary combination of (a) at least one bisresorcinyltriazine compound, as a first screening agent, and (b) at least one compound containing at least two benzoazolyl groups and/or at least one compound containing at least one benzodiazolyl group, as a second screening agent, the said first and second screening agents being present in the subject compositions in proportions eliciting a synergistic effect with regard to the protection factors conferred.
2. Description of the Prior Art
It is known to this art that light radiation of wavelengths of from 280 nm to 400 nm promotes tanning of the human epidermis and that irradiation with wavelengths of from 280 to 320 nm, i.e., UV-B radiation, cause erythemas and skin burns which may be harmful to the development of natural tanning; this UV-B radiation must therefore be screened from the skin.
It is also known to this art that UV-A radiation, with wavelengths of from 320 to 400 nm, which causes tanning of the skin, can also adversely affect it, in particular in the case of sensitive skin or of skin continually exposed to solar radiation. UV-A rays cause, in particular, a loss in the elasticity of the skin and the appearance of wrinkles, resulting in premature aging. Such irradiation promotes the triggering of the erythemal reaction or accentuates this reaction in certain individuals and can even be the cause of phototoxic or photoallergic reactions. It is therefore desirable to also screen out UV-A radiation.
A wide variety of cosmetic compositions for the photoprotection (UV-A and/or UV-B) of the skin are known to this art.
These photoprotective/sunscreen compositions are typically emulsions of oil-in-water type (namely, a cosmetically acceptable vehicle, diluent or carrier comprising a continuous aqueous dispersing phase and a non-continuous oily dispersed phase) which contains, in various concentrations, one or more conventional lipophilic and/or hydrophilic organic screening agents capable of selectively absorbing harmful UV radiation. These screening agents (and their amounts) are selected according to the desired protection factor (the protection factor (PF) being expressed mathematically by the ratio of the irradiation time required to attain the erythemogenic threshold with the UV screening agent to the time required to attain the erythemogenic threshold without UV screening agent).
SUMMARY OF THE INVENTION
It has now surprisingly and unexpectedly been determined that the binary combination of two specific sunscreen compounds already per se known to this art provided synergistically active sunscreen/antisun compositions exhibiting markedly improved protection factors.
Briefly, the present invention features novel cosmetic compositions, in particular photoprotective/sunscreen compositions, comprising, in a cosmetically acceptable vehicle, diluent or carrier, (a) at least one bisresorcinyltriazine compound, as a first screening agent, and (b) at least one compound containing at least two benzoazolyl groups and/or at least one compound containing at least one benzodiazolyl group, as a second screening agent, the said first and second screening agents being present in the subject compositions in proportions eliciting a synergistic effect with regard to the protection factors conferred.
The present invention also features the use of the subject compositions in the production of cosmetic compositions suited for the protection of the skin and/or hair against the deleterious effects of ultraviolet radiation, in particular solar radiation.
This invention thus also features cosmetic regime/regimen for the photoprotection of skin and/or hair against the damaging effects of ultraviolet radiation, in particular solar radiation, which essentially entails topically applying onto the skin/hair an effective photoprotecting amount of a composition in accordance herewith.
DETAILED DESCRIPTION OF BEST MODE AND SPECIFIC/PREFERRED EMBODIMENTS OF THE INVENTION
More particularly according to the present invention, novel cosmetic or dermatological compositions, in particular antisun/sunscreen compositions, are provided which comprise, formulated into a cosmetically acceptable vehicle, diluent or carrier therefor:
(a) at least one bisresorcinyltriazine compound, as a first screening agent, and
(b) at least one compound containing at least two benzazolyl groups and/or at least one compound containing at least one benzodiazolyl group, as a second screening agent, the said first and second screening agents being present in the subject compositions in proportions eliciting a synergistic effect with regard to the protection factors conferred.
By the term “containing at least two enzoazolyl groups” is intended, per molecule, at least two groups of the benzoxazolyl, benzothiazolyl or benzimidazolyl type.
By the term “containing at least one benzodiazolyl group” is intended, per molecule, a group of the benzodioxazolyl, benzodithiazolyl or benzodiimidazolyl type.
The bisresorcinyltriazine compounds according to the invention are preferably selected from among those having the following structural formula:
in which (i) the R
1
and R
2
radicals, which may be identical or different, are each a C
3
-C
18
alkyl radical, a C
2
-C
18
alkenyl radical, or a residue of the formula —CH
2
-CH(OH)—CH
2
—OT
1
wherein T
1
is a hydrogen atom, or a C
1
-C
8
alkyl radical; or (ii) the R
1
and R
2
radicals, which again may be identical or different, are each a residue of the following formula (1):
in which m
1
is a number ranging from 1 to 3; and R
3
is a hydroxyl group, a C
1
-C
5
alkyl radical which is unsubstituted or substituted by one or more hydroxyl groups, a C
1
-C
5
alkoxy radical, an amino group; a mono -or di(C
1
-C
5
)alkylamino radical, a metal cation M, or a residue having one of the following formulae (2) to (7):
in which the R
4
, R
5
and R
6
radicals, which may be identical or different, are each a C
1
-C
14
alkyl radical which is unsubstituted or substituted by one or more hydroxyl groups; R
7
is a hydrogen atom, a metal cation M, a C
1
-C
5
alkyl radical, or a residue of formula —(CH
2
)
m2
—OT
1
where m
2
is a number ranging from 1 to 4 and T
1
is as defined above; or (iii) the R
1
and R
2
radicals, which again may be identical or different, are each a residue of the following formula (8):
in which R
8
is a covalent bond, a linear or branched C
1
-C
4
alkyl radical, or a residue of formula —C
m4
H
2m4
— or —C
m4
H
2m4
—O— wherein m
4
is a number ranging from 1 to 4; p
1
is a number ranging from 0 to 5; the R
9
, R
10
and R
11
radicals, which may be identical or different, are each a C
1
-C
18
alkyl radical, a C
1
-C
18
alkoxy radical or a residue of the formula:
wherein R
12
is a C
1
-C
5
alkyl radical; A
1
is a residue having one of the following formulae:
in which R
7
is as defined above; R
13
is a hydrogen atom, a C
1
-C
10
alkyl radical, a radical of formula —(CH
2
CHR
16
—O)
n1
R
7
wherein n
1
is a number ranging from 1 to 16 and R
16
is a hydrogen atom or a methyl radical, or a residue of the formula —CH
2
—CH(OH)—CH
2
OT
1
wherein T
1
is as defined above; Q
1
is a C
1
-C
18
alkyl radical; and R
14
is a radical having the formula (1):
as described above.
In the above formulae (I) and (1) to (12);
the alkyl radicals are linear or branched and advantageously are selected, for example, from among methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, amyl, isoamyl, tert-amyl, heptyl, octyl, isooctyl, nonyl, decyl, und
Burns Doane Swecker & Mathis L.L.P.
Dodson Shelley A.
Societe L'Oreal S.A.
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