Method of improving field emission characteristics of diamond th

Coating processes – Coating by vapor – gas – or smoke – Carbon or carbide coating

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427 77, 427 78, 427377, 4273984, C23C16/26

Patent

active

059026405

ABSTRACT:
A method of preparing diamond thin films with improved field emission properties. The method includes preparing a diamond thin film on a substrate, such as Mo, W, Si and Ni. An atmosphere of hydrogen (molecular or atomic) can be provided above the already deposited film to form absorbed hydrogen to reduce the work function and enhance field emission properties of the diamond film. In addition, hydrogen can be absorbed on intergranular surfaces to enhance electrical conductivity of the diamond film. The treated diamond film can be part of a microtip array in a flat panel display.

REFERENCES:
patent: 4414176 (1983-11-01), Krauss et al.
patent: 4494965 (1985-01-01), Ali-Khan et al.
patent: 5064627 (1991-11-01), Zwart et al.
patent: 5108779 (1992-04-01), Gasworth
patent: 5110579 (1992-05-01), Anthony et al.
patent: 5451430 (1995-09-01), Anthony et al.
patent: 5571603 (1996-11-01), Utumi et al.
patent: 5580380 (1996-12-01), Liu et al.
Article "Effects of Potassium and Lithium Metal Deposition on the Emission Characteristics of Spindt-type Thin-film Field Emission Microcathode Arrays", Talin, A.A., T.E. Feller and D.J. Devine, J. Vac. Sci. Technol. B., vol. 13, No. 2 (Mar./Apr. 1995).
Article "Beyond AMLCDs: Field Emission Displays?", Derbyshire, K., Solid State Technology (Nov. 1994) pp. 55-65.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of improving field emission characteristics of diamond th does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of improving field emission characteristics of diamond th, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of improving field emission characteristics of diamond th will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-244698

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.