Metal layer patterning method

Details Metal layer patterning method Metal layer patterning method

1983-07-07

1986-12-16

Valentine, Donald R.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

20412975, 20412995, C25F 314

Patent

active

046295399

ABSTRACT:
A metal layer of aluminum, an aluminum-silicon alloy, aluminum-copper alloy, copper or chromium to be patterned is formed on an insulating substrate and a mask layer of a predetermined pattern is formed on the metal layer and then the metal layer is subjected to electrolytic etching by an electrolyte through the mask layer, forming a patterned metal layer.
When the metal layer is formed on aluminum, the electrolyte is an aqueous solution including a solute consisting principally of phosphoric acid; phosphoric acid and nitric acid; phosphoric acid, nitric acid and acetic acid; hydrochloric acid; potassium hydroxide; or sodium hydroxide.
When the metal layer is formed on the aluminum-silicon or aluminum-copper alloy, the electrolyte is an aqueous solution including a solute consisting principally of phosphoric acid; phosphoric acid and nitric acid; or phosphoric acid, nitric acid and acetic acid.
When the metal layer is formed of copper, the electrolyte is an aqueous solution including a solute consisting principally of sulfuric acid.
When the metal layer is formed chromium, the electrolyte is an aqueous solution including a solute consisting principally of drochloric acid.
A DC constant-current source is connected between the metal layer and an electrode corresponding thereto, and the electrolytic etching is carried out until voltage between metal layer and the electrode increases suddenly.
A DC constant-voltage source is connected between the metal layer and an electrode corresponding thereto, and the electrolytic etching is carried out until current flowing across the metal layer decreases suddenly.

REFERENCES:
patent: 3108931 (1963-10-01), Wendell, Jr.
patent: 3260660 (1966-07-01), Brooks
patent: 3267013 (1966-08-01), Mathias et al.
patent: 3560357 (1971-02-01), Shaw
patent: 3576722 (1971-04-01), Fennimore et al.
patent: 3785945 (1974-01-01), MacArthur
patent: 4247377 (1981-01-01), Eckler et al.

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