Method and apparatus for improved coating of a semiconductor waf

Details Method and apparatus for improved coating of a semiconductor waf Method and apparatus for improved coating of a semiconductor waf

1997-10-10

1999-05-11

Beck, Shrive

Coating apparatus

With means to centrifuge work

118321, 118323, 118715, 427240, B05C11/02

Patent

active

059023996

ABSTRACT:
A method and apparatus for coating liquid films on to the surface of a wafer substrate by rotation the substrate at a speed sufficient to cause a liquid, through centrifugal effect, to flow outwardly toward the perimeter of the surface and form a substantially uniform thickness liquid coating thereon and starting at the central region of the wafer surface and moving radially outward therefrom, spraying a fine mist of the liquid to the surface of the wafer.

REFERENCES:
patent: 4190015 (1980-02-01), Hillman
patent: 4267212 (1981-05-01), Sakawaki
patent: 4457259 (1984-07-01), Samuels
patent: 4640222 (1987-02-01), Gerber
patent: 5250114 (1993-10-01), Konishi et al.
patent: 5405443 (1995-04-01), Akimoto et al.

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