Photosensitive compositions

Details Photosensitive compositions Photosensitive compositions

1979-12-06

1981-07-21

Louie, Jr., Won H.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430916, 430920, 430288, 430343, 430175, 430177, 430191, 430196, 430278, 430281, 430286, 430287, 430339, 430270, 20415915, 20415918, 20415923, G03C 172, G03C 152, G03C 168

Patent

active

042799821

ABSTRACT:
A photosensitive composition containing the 2-trihalomethyl-5-aryl-1,3,4-oxadiazole compound represented by the following general formula: ##STR1## wherein X represents a chlorine atom or a bromine atom and A represents a phenyl group, a naphthyl group or a phenyl or naphthyl group substituted by a halogen atom, an alkyl group, an alkoxy group, a nitro group, a cyano group or a methylenedioxy group.

REFERENCES:
patent: 2975053 (1961-03-01), Schmidt et al.
patent: 3192103 (1965-06-01), Sousa et al.
patent: 3418118 (1968-12-01), Thommes et al.
patent: 3669658 (1972-06-01), Yonezawa et al.
patent: 3708297 (1973-01-01), Poot et al.
patent: 3970535 (1976-07-01), McGinniss
patent: 3987037 (1976-10-01), Bonham et al.
patent: 4040922 (1977-08-01), Wang et al.

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