Photosensitive member having amorphous silicon-germanium layer a

Details Photosensitive member having amorphous silicon-germanium layer a Photosensitive member having amorphous silicon-germanium layer a

1986-06-30

1989-09-05

Martin, Roland E.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 57, 430 65, 430 66, 430 67, 430 95, G03G 5082, G03G 514

Patent

active

048638200

ABSTRACT:
This invention discloses a photosensitive member which comprises in the order an electrically conductive substrate, a first layer region of amorphous silicon including carbon, a second layer region of amorphous silicon and a third layer region of amorphous silicon including germanium. Group IIIA impurity of the Periodic Table is included in all the layer region so as to be most enriched at the first layer region. The first layer region comprises a first amorphous silicon transient layer to assure the adhesion between the first and second layer region. Similarly, the third layer region comprises a second amorphous silicon transient layer to assure the adhesion between the second and third layer region.
This invention further relates to a process for producing by glow discharge a photosensitive member of the present invention.

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patent: 4683185 (1987-07-01), Osawa et al.
patent: 4686164 (1987-08-01), Osawa et al.
"A C-NMR Investigation of Plasma Polymerized Ethane, Ethylene, and Acetylene", by A. Dilks, S. Kaplan, and A. Vanlaeken, Xerox Webster Research Center, Xerox Square, W-114, Rochester, New York 14644.

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