Method and apparatus for producing etched plates for graphic pri

Details Method and apparatus for producing etched plates for graphic pri Method and apparatus for producing etched plates for graphic pri

1991-11-05

1992-05-12

Valentine, Donald R.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

20412965, 204224M, 204228, 204277, 204238, 204275, 204237, C25F 314, C25F 700

Patent

active

051124530

ABSTRACT:
There is provided an apparatus and a process for using same for etching a metallic object (22), suitably a plate to prepare a metallic printing plate. The object is partially covered by a resist surface (14) wherein the exposed portions (16) of said metal, will be exposed to the action of an electrolytic etchant force. The apparatus comprises a bath (10) for an aqueous electrolyte (12), an electrode (23), suitably but not critically metallic, immersible in said electrolyte, which will serve as the cathode, a source of direct current voltage (32), which may further be associated with adjustment means (38) for controlling the applied voltage. The voltage should be adjustable to operate accurately within a rather narrow voltage range, such that the minimum voltage shall be at least that of the ionization potential of the metal of the metal object in the electrolyte chosen and the maximum shall not substantially exceed the sum of the decomposition voltage of the aqueous electrolyte and the over-voltage of the cathode selected.

REFERENCES:
patent: 984011 (1911-02-01), LaPointe
patent: 2394190 (1946-02-01), Kreck
patent: 4247377 (1981-01-01), Eckler et al.
patent: 4269679 (1981-05-01), Moura
patent: 4560464 (1985-12-01), Lieber
patent: 4729940 (1988-03-01), Nee et al.

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