Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1985-08-02
1987-11-24
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430321, 430966, 378 34, 378 35, G03F 900, G03C 500, G21K 500
Patent
active
047089199
ABSTRACT:
A process for manufacturing a mask for use in X-ray photolithography begins with a step of providing a glass disk (50) which is coated with a layer of boron nitride (52). The glass disk is about 1/4 of an inch thick and about 4.5 to 6 inches in diameter. A circular portion (50a) of the boron nitride layer on one side of the glass disk is removed thus exposing a circular portion of the glass disk. The exposed portion of the glass disk is then removed, leaving a glass ring coated with a boron nitride membrane on one side. A layer of polyimide (54) and a layer of x-ray opaque substance (58) is deposited on the boron nitride membrane. The x-ray opaque substance is then patterned, the resulting structure being a mask which is used in X-ray photolithography.
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Buckley, W. D. et al., "X-Ray Lithography Mask Technology", J. Electrochem Soc: Solid State Science & Technology, May, 1981, vol. 128, No. 5, pp. 1116-1120.
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Block et al., U.S. Patent Application Ser. No. 06/761,993 filed 08/02/85 entitled "Method for Producing a Mask for use in X-Ray Photolithography and Resulting Structure".
LaBrie James J.
Shimkunas Alexander R.
Kittle John E.
Leeds Kenneth E.
MacPherson Alan H.
Micronix Corporation
Ryan Patrick J.
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