Spinning reticle scanning projection lithography exposure system

Details Spinning reticle scanning projection lithography exposure system Spinning reticle scanning projection lithography exposure system

1994-09-21

1995-07-18

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

378 34, 355 50, H01J 37317, G03B 2746, G21K 106

Patent

active

054344247

ABSTRACT:
A reticle disk with an annular pattern area is used in a reduction projection lithography system in place of a reticle with a rectilinear pattern layout. The reticle disk is rotated on a continuous basis during patterning of a substrate, and the patterning-beam emanating from the annular pattern area is scanned over the substrate using an X-Y stage. The imaging beam, which is preferably an electron-beam, may be scanned across the annular pattern area in a radial direction to allow patterning a plurality of subfields.

REFERENCES:
patent: 4613981 (1986-09-01), Siddall et al.
patent: 5263073 (1993-11-01), Feldman
patent: 5289231 (1994-02-01), Magome et al.

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