Method for testing the sheet resistivity of diffused layers

Fishing – trapping – and vermin destroying

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437153, H01L 2166

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active

054340896

ABSTRACT:
A method and apparatus for testing the sheet resistivity of the diffused layers includes adding to each wafer batch, withstanding a doping and diffusion process, at least one reference wafer subject to the same process, and carrying out measurements in a plurality of areas of each reference wafer. Prior to each doping and diffusion step, a window is opened in each measurement area of the reference wafer so that the doping and diffusion operation is achieved only in a portion of the area where the measurement is subsequently carried out.

REFERENCES:
patent: 3134077 (1964-05-01), Hutchins, IV et al.
patent: 3839103 (1979-11-01), Nienhuis et al.
patent: 4151019 (1979-04-01), Tokumaru et al.
patent: 4257825 (1981-05-01), Schaumburg
patent: 4440799 (1984-04-01), Faith, Jr.
patent: 4706015 (1987-11-01), Chen
patent: 5010029 (1991-04-01), Liu et al.
patent: 5256577 (1993-11-01), Pluntke et al.
RCA Review, Dec. 1963 pp. 528-533.
Solid State Technology, vol. 26, No. 8, Aug. 1983, Washington, US, pp. 159-167, Gruber, "Ion Implant Testing for Production Control".
Solid State Technology, vol. 27, No. 12, Dec. 1984, Washington, US, pp. 125-132, Brennan & Dickey, "Determination of Diffusion Characteristics Using Two-and Four-Point Probe Measurements".

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