Method of forming thin epitaxial layers using multistep growth f

Details Method of forming thin epitaxial layers using multistep growth f Method of forming thin epitaxial layers using multistep growth f

1988-06-03

1989-08-22

Hearn, Brian E.

Fishing, trapping, and vermin destroying

148DIG7, 148DIG15, 148DIG25, 148DIG29, 156613, 437 95, 437 97, 437110, 437112, 437946, H01L 2120, H01L 21205

Patent

active

048596264

ABSTRACT:
A method of forming thin epitaxial layers by subjecting a substrate to a high temperature prebake followed by a medium temperature capping seal and a low temperature deposition is disclosed. In a preferred embodiment the epitaxial layer is formed by low pressure chemical vapor deposition of dichlorosilane. The method has been demonstrated to alleviate the increase in autodoping and epitaxial defects normally associated with lowering the deposition temperature.

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