Imaging members with plasma deposited silicon oxides

Details Imaging members with plasma deposited silicon oxides Imaging members with plasma deposited silicon oxides

1987-05-04

1989-08-22

Goodrow, John L.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 63, 430 84, 430 95, G03G 510

Patent

active

048595535

ABSTRACT:
Disclosed is an electrographic imaging member comprised of a supporting substrate; and in contact therewith components comprised of regions of a photogenerating substance dispersed in a charge transporting material comprised of plasma deposited silicon oxide with at least 50 atomic percent of oxygen.

REFERENCES:
patent: 4557987 (1985-12-01), Shirai et al.
patent: 4613556 (1986-09-01), Mort et al.
patent: 4663258 (1987-05-01), Pai et al.
patent: 4698288 (1987-10-01), Mort
"Thin Film Preparation by Plasma and Low Pressure CVD in a Horizontal Reactor", C. E. Morosana & V. Soltuz, Jan. 19, 1981, Vacuum, vol. 31, No. 7, pp. 309 to 313.

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