Method of measuring optical characteristics of thin film and app

Details Method of measuring optical characteristics of thin film and app Method of measuring optical characteristics of thin film and app

1992-07-07

1994-05-10

Housel, James C.

Optics: measuring and testing

By polarized light examination

356365, 356366, 356367, 356368, 356382, G01J 400, G01B 1106

Patent

active

053112849

ABSTRACT:
In a first step, the value of the synthetic retardation and the direction of the synthetic optical axis as angle data of a transparent substrate having a thin film thereon are measured. In a second step, the value of the retardation and the direction of an optical axis as angle data of only the transparent substrate are measured. In a third step, the value of the retardation and the direction of an optical axis as an angle of only the thin film are calculated in accordance with the following equations on the basis of the value of the retardation and the angle data of the direction of the optical axis which are calculated in the first step and the value of the retardation and the angle data of the direction of the optical axis of only the transparent substrate which are calculated in the second step: ##EQU1##

REFERENCES:
patent: 3158675 (1964-11-01), Murray et al.
patent: 3941482 (1976-03-01), Schneider
patent: 3985447 (1976-10-01), Aspnes
patent: 4801798 (1989-01-01), Lange
patent: 4873430 (1989-10-01), Juliana et al.
patent: 4878755 (1989-11-01), Siegmund et al.
patent: 4973163 (1990-11-01), Sakai et al.
patent: 4999014 (1991-03-01), Gold et al.
patent: 5101111 (1992-03-01), Kondo
The Review of Scientific Instruments, vol. 40, No. 6, Jun. 1969, pp. 761-727. An Improved Method for High Reflectivity Ellipsometry Based on a New Polization Modulation Technique.
Applied Optics, vol. 14, No. 3, Mar. 1975, pp. 757-760, High Frequency Polarization Modulation Method for Measuring Birefringence.

Affiliated with

Also associated with

Rating

Method of measuring optical characteristics of thin film and app does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of measuring optical characteristics of thin film and app, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of measuring optical characteristics of thin film and app will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2415582