Method of heating semiconductor and susceptor used therefor

Details Method of heating semiconductor and susceptor used therefor Method of heating semiconductor and susceptor used therefor

1987-03-06

1989-01-17

Leung, Philip H.

Electric heating

Metal heating

Of cylinders

219 10491, 219 1067, 219 1079, 118 501, 118728, H05B 610

Patent

active

047989262

ABSTRACT:
Disclosed is a method of heating a semiconductor in a heat treatment apparatus for heating the semiconductor at a high temperature, in which a semiconductor is put in the heat treatment apparatus, and an alternating magnetic field is applied to a low-resistance ferromagnetic substance disposed in the heat treatment apparatus and isolated by a material inert to a required treatment atmosphere in the heat treatment apparatus to generate heat in the low-resistance ferromagnetic substance to thereby carry out heat treatment on the semiconductor. Further disclosed is a susceptor for supporting a semiconductor inertly to a required treatment atmosphere in a heat treatment apparatus, the susceptor being constituted by a material which is inert to the treatment atmosphere in the treatment apparatus and a low-resistance ferromagnetic substance isolated by the inert material from the treatment atmosphere. Preferably, a Curie point of the low-resistance ferromagnetic substance is set in accordance with a temperature at which the semiconductor is heated.

REFERENCES:
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patent: 3521018 (1970-07-01), Boerger et al.
patent: 3665139 (1972-05-01), Steggewentz
patent: 3684853 (1972-08-01), Welch et al.
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patent: 3979572 (1976-09-01), Ito et al.
patent: 4499354 (1985-02-01), Hill et al.
patent: 4633051 (1986-12-01), Olson

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