Chemistry: electrical and wave energy – Apparatus – Electrophoretic or electro-osmotic apparatus
Patent
1996-06-27
1998-10-20
Gorgos, Kathryn L.
Chemistry: electrical and wave energy
Apparatus
Electrophoretic or electro-osmotic apparatus
422 99, 204451, G01N 2726
Patent
active
058242040
ABSTRACT:
A micromachined structure for handling fluids with an applied high voltage, i.e. for electrophoresis, includes a glass or other highly insulative substrate on which are formed very small diameter capillary channels of e.g. silicon nitride. Due to the absence of a silicon substrate, this structure is highly electrically insulative. The silicon nitride channels are formed by a micro-machining and etch process, so that they are initially defined in an etched sacrificial silicon wafer by conformal coating of etched features in the silicon wafer with a silicon nitride layer, which is then patterned to define the desired channels. The silicon wafer is bonded to the glass substrate and the bulk of the silicon wafer is sacrificially etched away, leaving the desired silicon nitride channels with supporting silicon mesas. The remaining silicon nitride "shell" is bonded to the glass substrate and substantially duplicates the etched features in the original silicon wafer. The capillary channels are of a material such as low stress silicon nitride and there is no electrical shorting path to the highly insulative glass substrate.
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Gorgos Kathryn L.
IC Sensors Inc.
Klivans Norman R.
Noguerola Alex
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