Novolak resin blends for photoresist applications

Details Novolak resin blends for photoresist applications Novolak resin blends for photoresist applications

1996-08-05

1997-07-08

Seidleck, James J.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

528129, 528230, 528232, 430192, C08F28300, C08G 828, C08L 6100, C08L 6106

Patent

active

056462182

ABSTRACT:
The present invention relates to a water insoluble, aqueous alkali soluble novolak resin blend, wherein the resin blend comprises two novolaks having dissimilar relative molecular weights and similar dissolution rates, a process for producing such a resin blend, a photoresist containing such a resin blend and a method for producing a semi-conductor device utilizing such a photoresist.

REFERENCES:
patent: 4988601 (1991-01-01), Ushirogouchi et al.

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