Method of fabricating ultra-large-scale integration metal-oxide

Fishing – trapping – and vermin destroying

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437 41, 437 57, 437200, 437 34, H01L 21265

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056460562

ABSTRACT:
In a method for fabricating a ULSI MOSFET, an additional polysilicon layer is used to form polysilicon/metal compound metal contacts on source and drain regions and a gate so as to avoid leakage current and short channel effect problems.

REFERENCES:
patent: 4859618 (1989-08-01), Shikata et al.
patent: 4978629 (1990-12-01), Komori et al.
patent: 4992388 (1991-02-01), Pfiester
patent: 5175118 (1992-12-01), Yoneda
patent: 5196357 (1993-03-01), Boardman et al.
patent: 5231038 (1993-07-01), Yamaguchi et al.
patent: 5270232 (1993-12-01), Kimura et al.
patent: 5296727 (1994-03-01), Kawai et al.
patent: 5374574 (1994-12-01), Kwon
patent: 5374575 (1994-12-01), Kim et al.
patent: 5464782 (1995-11-01), Koh
patent: 5466615 (1995-11-01), Tsai
patent: 5489543 (1996-02-01), Hong

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