Method and apparatus for plasma treatment of a surface

Details Method and apparatus for plasma treatment of a surface Method and apparatus for plasma treatment of a surface

1996-06-28

1997-07-08

Niebling, John

Coating apparatus

Gas or vapor deposition

With treating means

118723MR, 118723ME, C23C 1600

Patent

active

056456450

ABSTRACT:
A radiofrequency wave apparatus and method which provides a relatively high concentration of reactive species from a plasma for the treatment of a surface particularly of a substrate (31) with a complex geometry in a holder (62) which masks a portion of the substrate. The radiofrequency waves are preferably microwaves or UHF waves. The apparatus and method is particularly useful for rapid plasma assisted chemical vapor deposition of diamond on a portion of the substrate, particularly on surfaces of objects with complex geometries such as a drill (60) or a seal ring (64).

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