Infra-red scanning microscopy

Details Infra-red scanning microscopy Infra-red scanning microscopy

1991-07-26

1993-11-16

Dzierzynski, Paul M.

Radiant energy

Invisible radiant energy responsive electric signalling

Infrared responsive

250353, G01J 100

Patent

active

052626466

ABSTRACT:
A method of assessment of semiconductor wafers by infra-red scanning microscopy illuminates a wafer with infra-red light through its polished face and detects light emanating from the same face by back-scattering from particles within the specimen, the light being back-scattered through an angle of more than 90.degree.. Measures are taken to reduce the effects of specular reflection from the surface, which measures may include the use of stop/mirror arrangements and/or the use of an aperture plate for confocal discrimination.

REFERENCES:
patent: 3624400 (1971-11-01), Cohen
patent: 4501966 (1985-02-01), Fosman et al.
patent: 4661706 (1987-04-01), Messerschmidt et al.
patent: 4843242 (1989-06-01), Doyle
patent: 4859064 (1989-08-01), Messerschmidt et al.
IEE Proceedings-I/Solid-State and Electron Devices, vol. 134, No. 3, Part I, Jun. 1987, pp. 85-86, Stevenage, Herts, GB; D. K. Hamliton et al.; "Optical Sectioning in Infra-red Scanning Microscopy".

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