Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1974-11-07
1976-06-01
Kendall, Ralph S.
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427 34, 427 41, 204298, 219121EB, 423446, C23C 1100
Patent
active
039611035
ABSTRACT:
A method and apparatus for depositing a thin film of material upon a base substrate including a glow discharge ion source for generating the particular ions that will be subsequently deposited upon the base substrate, a vacuum deposition chamber wherein the substrate material is located, and, intermediate between the glow discharge ion source and the vacuum deposition chamber, a constrictor electrode for isolating the deposition chamber from the ion chamber and an anode electrode for extracting ions from the glow discharge ion source and directing them toward the target substrate. A magnetic field is also provided in the apparatus of the present invention by the use of an externally wound magnetic coil to permit the glow discharge ion source to operate at a lower pressure and to constrict the flow of ions toward the substrate.
REFERENCES:
patent: 3117022 (1964-01-01), Bronson et al.
patent: 3294583 (1966-12-01), Fedows-Fedotowsky
patent: 3297465 (1967-01-01), Connell et al.
patent: 3303319 (1967-02-01), Steigerwald
patent: 3494852 (1970-02-01), Doctoroff
patent: 3534385 (1970-10-01), Castaing et al.
patent: 3751310 (1973-08-01), Cho
Birch Richard J.
Kendall Ralph S.
Space Sciences, Inc.
LandOfFree
Film deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Film deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Film deposition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2403620