Reduction of organic sulfur compounds

Organic compounds -- part of the class 532-570 series – Organic compounds – Sulfur containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

568 60, 568 67, 568 69, C07C14930, C07C14928, C07C14906

Patent

active

048229180

ABSTRACT:
Organic sulfur compounds, such as sulfonic acids, sulfonyl halides, sulfonates, sulfonamides, sulfonic acid anhydrides, sulfones, sulfoxides and/or disulfanes, are reduced by a method in which the sulfur compound in the liquid or gas phase is reacted with a hydrocarbon in the presence of carbon at from 100.degree. to 500.degree. C.

REFERENCES:
patent: 2506416 (1950-05-01), Gilbert et al.
patent: 4278816 (1981-07-01), Shim
patent: 4284817 (1981-08-01), Shim et al.
K. Fujimoto, K. Masamizu, S. Asaoka, T. Kunugi: Nippou Kagaku Kaishi 1976, 1067.
Ullmanns Encyklopadie der Technischen Chemie, 4th Ed., vol. 23, (1983), p. 188 and translation.
Houben-Weyl, Methoden der Organischen Chemie, vol. 4/1c, (1980), pp. 486-489 and translation.
Houben-Weyl, Methoden der Organischen Chemie, vol. 9, pp. 23-33, 1955.
Houben-Weyl, Methoden der Organischen Chemie, vol. 4/1c, pp. 486-489, 664-667, 1980.
Houben-Weyl, Methoden der Organischen Chemie, vol. 4/1d, pp. 680-681, 1981.
Houben-Weyl, Methoden der Organischen Chemie, vol. E 11/1, pp. 48-54, 1985.
K. Habashi, Yuki Gosei Kagaku Kyokai Shi 19, pp. 266, 271 and 601, 1967.
Y. Drabowicz, T. Numata and S. Oae, Org. Prep. Proc. Int. 9, p. 64 1977.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Reduction of organic sulfur compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reduction of organic sulfur compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reduction of organic sulfur compounds will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2397851

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.