Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1986-12-08
1989-04-18
Bleutge, John C.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430197, 430175, 430176, 430270, 430272, 430287, 528 10, 528 43, 528 26, 528 29, G03C 152, G03L 1495
Patent
active
048227161
ABSTRACT:
The polysilanes and polysiloxanes of the present invention are polymers that contain silicon in the principal chain, and contain in the side chains alkaline soluble groups such as phenol-based hydroxy group and carboxyl group.
One silicone resist material of the present invention comprises the polysilane or the polysiloxane in the above.
Another silicone resist material of the present invention contains the above polysilane or polysiloxane, and an appropriate photosensitive agent.
Still another silicone resist material of the present invention does not contain the above photosensitive agent, and in its stead, it contains a group that possesses photosensitive to ultraviolet rays or the like, via a siloxane bonding in the principal chain. As a substance with such photosensitivity, one may mention, for example, o-nitrobenzylsilyl groups that presents alkaline solubility when it is irradiated by ultraviolet rays.
Accordingly, the silicone resist materials of the present invention, especially the second and third silicone resist materials, are alkaline developable, and also possess a superior resistance to oxygen plasma. Therefore, they can be used as a top layer film in the two-layered resist system, making it possible to form very fine resist patterns, fast and with a minimum number of processing steps.
REFERENCES:
patent: 3410820 (1968-11-01), Harrod
patent: 4481279 (1984-11-01), Naito et al.
patent: 4544729 (1985-10-01), Nate
patent: 4599155 (1986-07-01), Suzuki et al.
Hayase Shuji
Hirao Akiko
Horiguchi Rumiko
Onishi Yasunobu
Bleutge John C.
Dean, Jr. Ralph
Kabushiki Kaisha Toshiba
LandOfFree
Polysilanes, Polysiloxanes and silicone resist materials contain does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Polysilanes, Polysiloxanes and silicone resist materials contain, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polysilanes, Polysiloxanes and silicone resist materials contain will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2396611