Method of plasma-activated reactive deposition of electrically c

Details Method of plasma-activated reactive deposition of electrically c Method of plasma-activated reactive deposition of electrically c

1996-05-02

1997-04-08

Bell, Bruce F.

Chemistry: electrical and wave energy

Apparatus

Electrolytic

C25B 1100

Patent

active

056183950

ABSTRACT:
Uniform electrically conducting multicomponent material is deposited on an electrically conducting substrate by means of a PCVD method. A plasm, for example a glow discharge plasm, a high frequency plasm or a microwave plasm is generated in a reaction space. The plasma is periodically reciprocated. Starting materials for the single components of the multicomponent material are added to a flowing gas phase. To obtain multicomponent material of the desired composition, the flowing gas phase is split into at least two flowing gas phases each comprising only starting materials for a single component of the multicomponent material. The separate gas phases are time sequentially applied to the plasma. The deposited multicomponent material my be subjected to a thermal treatment.

REFERENCES:
patent: 5098546 (1992-03-01), Kawashima et al.
patent: 5169508 (1992-12-01), Suzuki et al.
patent: 5248401 (1993-09-01), Bridger et al.

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