Method and apparatus of measuring line structures with an optica

Details Method and apparatus of measuring line structures with an optica Method and apparatus of measuring line structures with an optica

1992-03-06

1994-12-20

Mancuso, Joseph

Image analysis

Histogram processing

For setting a threshold

382 36, 356384, G01B 1102

Patent

active

053751752

ABSTRACT:
A method of processing images obtained with a microscope along a line on an object, in which the object, having trenches or lines, is moved in the z direction to form a cloud plot; signals in the z direction are scanned to form a linescan vector; the linescan vectors are clustered and classified; a centroid is defined; a similarity curve is created from the linescan vectors and the centroids; and the distance between adjacent points on the similarity curve are measured to provide a measure of line or trench width.

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patent: 4818110 (1989-04-01), Davidson
patent: 4854708 (1989-08-01), Kafri et al.
S. Chim, J. Berman, & G. Kino, An Interferometric Correlation Microscope, MICRO 90, London, 2-6 Jul., 1990, Ch. 8.
C-H. Chou, J. Berman, S. Chim, T. Corle, G. Xiao & G. Kino, Pattern Recognition Approach to Trench Bottom-width Measurement, SPIE's Symp on Microlithography, San Jose, Calif. 3-8 Mar. 1991.
S. Chim & G. Kino, Correlation Microscope, Optics Letters vol. 15 No. 10, May 15, 1990.
G. Kino & S. Chim, Mirau Correlation Microscope, Applied Optics vol. 29 No. 26, Sep. 10, 1990.
G. Knio, Scanning Optical Microscopy, J. Vac. Sci. Technol. B 8 (6), Nov./Dec. 1990.

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