Photochemical vapor deposition apparatus

Details Photochemical vapor deposition apparatus Photochemical vapor deposition apparatus

1985-03-25

1986-12-16

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118723, 118620, 118641, 118 501, C23C 1308

Patent

active

046288627

ABSTRACT:
A photochemical vapor deposition apparatus which includes a reaction chamber, a means for introducing a starting gas for film formation into the reaction chamber and a means for irradiating the starting gas with a light of high energy and deposites a thin film on a substrate placed in the reaction chamber by utilizing the photochemical reaction, characterized in that the apparatus includes a means for heating in advance to high temperature the starting gas to be introduced into the reaction chamber.

REFERENCES:
patent: 4371587 (1983-02-01), Peters
patent: 4435445 (1984-03-01), Allred et al.
patent: 4496609 (1985-01-01), McNeilly et al.
patent: 4516527 (1985-05-01), Sugioka
patent: 4522674 (1985-06-01), Ninomiya et al.
patent: 4533820 (1985-08-01), Shimizu

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