Positive resist composition

Details Positive resist composition Positive resist composition

1993-11-08

1994-12-20

Ivy, C. Warren

Organic compounds -- part of the class 532-570 series

Organic compounds

Heterocyclic carbon compounds containing a hetero ring...

430191, C07D31182

Patent

active

053747429

ABSTRACT:
A positive resist composition comprising an alkali-soluble resin, a quinone diazide compound and a specific hydroxyl group-containing compound can improve sensitivity without deterioration of heat resistance and film thickness retention.

REFERENCES:
patent: 4626492 (1986-12-01), Eilbeck
patent: 4883739 (1989-11-01), Sakaguchi et al.
patent: 5112719 (1992-05-01), Yamada et al.
CA 116(6): 48934y.
"Condensation Products of Phenols and Ketones, Part XII. Studies with m-cresols, m-ethylphenol and 3,4-dimethylphenol" by Wilson Baker et al, Journal of the Chemical Society, Jul. 1957, pp. 3060-3064.

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