Method of fabricating stacked capacitor cell memory devices

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437 52, 437919, H01L 21265, H01L 2170, H01L 2700

Patent

active

053745760

ABSTRACT:
A semiconductor memory device having STC cells wherein the major portions of active regions consisting of channel-forming portions are inclined at an angle of 45 degrees with respect to word lines and bit lines that meet at right angles with each other, thereby enabling the storage capacity portions to be arranged very densely and a sufficiently large capacity to be maintained with very small cell areas. Since the storage capacity portions are formed even on the bit lines, the bit lines are shielded, so that the capacity decreases between the bit lines and, hence, the memory array noise decreases. It is also possible to design the charge storage capacity portion so that a part of thereof has a form of a wall substantially vertical to the substrate in order to increase the capacity.

REFERENCES:
patent: 4151607 (1979-04-01), Koyanagi et al.
patent: 4309812 (1982-01-01), Horng et al.
patent: 4355374 (1982-10-01), Sakai et al.
patent: 4475118 (1984-10-01), Klein et al.
patent: 4583281 (1986-04-01), Ghezzo et al.
patent: 4649406 (1987-03-01), Takemae et al.
patent: 4651183 (1987-03-01), Lange et al.
patent: 4742018 (1988-05-01), Kimura et al.
patent: 4754313 (1988-06-01), Takemae et al.
patent: 4794563 (1988-12-01), Maeda
patent: 4871688 (1988-05-01), Lowrey
patent: 4882789 (1989-11-01), Moriuchi et al.
patent: 4885259 (1989-12-01), Osinski
patent: 4905064 (1990-02-01), Yabu et al.
patent: 4910566 (1990-03-01), Ema
patent: 5128273 (1992-07-01), Ema
patent: 5196365 (1993-03-01), Gotou
patent: 5205295 (1991-06-01), Kuestars et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of fabricating stacked capacitor cell memory devices does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of fabricating stacked capacitor cell memory devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating stacked capacitor cell memory devices will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2385971

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.