Process for forming semiconductor device using beveled clamp fin

Details Process for forming semiconductor device using beveled clamp fin Process for forming semiconductor device using beveled clamp fin

1997-02-05

1999-12-28

Everhart, Caridad

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

438631, 438697, 118729, H01L 21461

Patent

active

060081341

ABSTRACT:
Beveled clamp fingers (48) are used in an etching system. The beveled top surfaces (40) of the clamp fingers allow etching species to attack more readily the layer being etched at locations near the beveled clamp fingers (48), thereby reducing the size of halo regions (622). In other embodiments, triangular clamp fingers (78) or clamp fingers (88) with rounded top surfaces can be used.

REFERENCES:
patent: 4969550 (1990-11-01), Van Laarhove
patent: 5124272 (1992-06-01), Saito et al.
patent: 5268067 (1993-12-01), Dostalik et al.
patent: 5316278 (1994-05-01), Sherstinsky et al.

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