Photoresist material based on polystyrenes

Details Photoresist material based on polystyrenes Photoresist material based on polystyrenes

1993-04-22

1994-06-28

Schofer, Joseph L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

526270, 526271, 526262, 526265, C08F 1224

Patent

active

053248040

ABSTRACT:
Compounds of formula (I) ##STR1## wherein R.sub.1 is hydrogen, methyl or halogen, n is 2 or 3, and R is C.sub.1 -C.sub.6 alkyl, benzyl, 2-tetrahydrofuranyl, 2-tetrahydropyranyl, C.sub.1 -C.sub.6 alkoxycarbonyl, phenoxycarbonyl or benzyloxycarbonyl, or, if two substituents OR are ortho-positioned to each other, two substituents R together form an ethylene group which may be substituted by up to four C.sub.1 -C.sub.6 alkyl groups, or form a C.sub.2 -C.sub.6 alkylidene group, can be polymerized in the absence or presence of other unsaturated comonomers to polymers having a molecular weight M.sub.w of 10.sup.3 to 10.sup.6 and which are suitable for producing positive photoresists with high resolution and very good contrast.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 5069997 (1991-02-01), Schwalm et al.
patent: 5262502 (1993-11-01), Fujisawa et al.
J. Appl. Pol. Sci. 42, 877(1991).

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