1980-08-29
1984-02-14
Larkins, William D.
357 59, H01L 2704, G11C 1140
Patent
active
044320060
ABSTRACT:
In a semiconductor memory device of the present, due to a heavily doped region formed on the semiconductor substrate, the depletion layer does not spread deeply toward the interior of the semiconductor substrate. In addition, a capacitor is formed by the heavily doped region, an insulating film formed on this region and a semiconductor layer formed on this insulating film. As a result, variation of capacitance of the capacitor due to .alpha.-ray particles is low. Furthermore, information is stored in the semiconductor layer which is formed above the semiconductor substrate so that the occurrence of a soft error is minimized.
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May et al., IEEE Trans. ED, vol. ED 26, no. 1, Jan. 1979, pp. 2-8.
Barson et al., IBM Tech. Discl. Bulletin, vol. 16, No. 6, Nov. 1973, p. 1698.
Fujitsu Limited
Larkins William D.
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